ECR-MBE growth of GaN on LiGaO2

被引:11
|
作者
Okada, M
Higaki, Y
Yanagi, T
Shimizu, Y
Nanishi, Y
Ishii, T
Miyazawa, S
机构
[1] Ritsumeikan Univ, Dept Photon, Shiga 52577, Japan
[2] NTT, Syst Elect Labs, Atsugi, Kanagawa 24301, Japan
关键词
GaN; LiGaO2; epitaxial growth; ECR-MBE; PL;
D O I
10.1016/S0022-0248(98)00231-0
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
GaN thin films were grown at relatively low temperatures on multi-domain LiGaO2 substrates by electron-cyclotron-resonance plasma-excited molecular beam epitaxy (ECR-MBE). LiGaO2 is one of the most promising substrates for GaN epitaxial growth because of its small lattice mismatch of around 0.9%. The multi-domain LiGaO2 substrate has two different polarity domains in the (0 0 1) surface. Two different GaN surface morphologies depending on the surface polarities were observed by atomic force microscopy (AFM). The difference was also observed in the shift of photoluminescence (PL) spectra. Each peak corresponding to two inversion domains was shifted in parallel around 2 nm. One possible explanation for the cause of the peak wavelength shift is cue io the difference of the strains in GaN thin films. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:213 / 217
页数:5
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