Thermal decomposition mechanisms of methylamine, ethylamine, and 1-propylamine on Si(100)-2 x 1 surface

被引:12
|
作者
Cho, Jieun [1 ]
Choi, Cheol Ho
机构
[1] Kyungpook Natl Univ, Dept Chem, Taegu 702701, South Korea
来源
JOURNAL OF CHEMICAL PHYSICS | 2011年 / 134卷 / 19期
关键词
SCANNING-TUNNELING-MICROSCOPY; MM3; FORCE-FIELD; DISSOCIATIVE ADSORPTION; MOLECULAR-MECHANICS; NH3; ADSORPTION; CORE-LEVEL; N; 1S; CHEMISTRY; METHANOL; AMMONIA;
D O I
10.1063/1.3589362
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The thermal decomposition reactions of methylamine, ethylamine, and 1-propylamine absorbed on Si(100)-2 x 1 surface were theoretically investigated. Eight decomposition channels were found leading to desorption products of imine, H-2, alkyl cyanide, ammonia, aziridine, alkene, azetidine, and cyclopropane, which supports the experimental assignments. Our mechanistic studies strongly suggest that the alkyl cyanide (hydrogen cyanide in the case of methylamine) channel is coupled with the hydrogen desorption step. The beta-hydrogen of ethylamine and 1-propylamine was found to undergo additional decomposition reactions producing aziridine and alkene, which were classified as gamma- and beta-eliminations, respectively. It was also found that the gamma-hydrogen of 1-propylamine undergoes azetidine and cyclopropane producing decompositions, which were classified as delta- and gamma-eliminations. In general, gamma- and delta-hydrogen involved decomposition reactions are kinetically less favorable than beta-hydrogen involved ones. Consequently, it is expected that the thermal decompositions of the primary alkyl amines with longer alkyl chains would not add additional favorable decomposition channels. Except alkyl cyanide and ammonia desorption channels, the decompositions occur in a concerted fashion. (C) 2011 American Institute of Physics. [doi:10.1063/1.3589362]
引用
收藏
页数:8
相关论文
共 50 条
  • [21] The growth of Zn on a Si(100)-2 x 1 surface
    Xie, ZX
    Tanaka, K
    ULTRAMICROSCOPY, 2005, 105 (1-4) : 6 - 11
  • [22] Adsorption and decomposition of Si2H5 on Si(100)-(2x1) surface: A computational study
    Chang, Jee-Gong
    Chen, Hsin-Tsung
    Chiang, Hsing-Jung
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2011, 241
  • [23] A model calculation for the isomerization and decomposition of chemisorbed HCN on the Si(100)-2x1 surface
    Bacalzo-Gladden, F
    Musaev, DG
    Lin, MC
    JOURNAL OF THE CHINESE CHEMICAL SOCIETY, 1999, 46 (03) : 395 - 402
  • [24] Chemisorption and decomposition of thiophene and furan on the Si(100)-2 x 1 surface: A quantum chemical study
    Lu, X
    Xu, X
    Wang, NQ
    Zhang, Q
    Lin, MC
    JOURNAL OF PHYSICAL CHEMISTRY B, 2001, 105 (41): : 10069 - 10075
  • [25] Theoretical investigation of the initial reaction of the NO decomposition on the Si (100) (2x1) reconstructed surface
    Korkin, AA
    Demkov, AA
    Tanpipat, N
    Andzelm, J
    JOURNAL OF CHEMICAL PHYSICS, 2000, 113 (18): : 8237 - 8248
  • [26] LOW-TEMPERATURE ADSORPTION AND DECOMPOSITION OF BORAZINE ON THE SI(100)-(2X1) SURFACE
    CHIANG, CM
    GATES, SM
    BEACH, DB
    SURFACE SCIENCE, 1992, 261 (1-3) : 88 - 98
  • [27] THERMAL AND CATALYTIC DECOMPOSITION OF SI2H6 ON A GE(100)2X1 SURFACE - PHOTOEMISSION AND LEED STUDIES
    STEINMETZ, D
    VAN, S
    RINGEISEN, F
    BOLMONT, D
    KOULMANN, JJ
    SURFACE SCIENCE, 1994, 307 : 253 - 257
  • [28] COAXIAL SCATTERING PROBE OF THE SURFACE AND SUBSURFACE STRUCTURE OF THE SI(100)-(2 X-1) AND SI(100)-(1 X 1)-H PHASES
    WANG, Y
    TEPLOV, SV
    ZAPOROZCHENKO, OS
    BYKOV, V
    RABALAIS, JW
    SURFACE SCIENCE, 1993, 296 (02) : 213 - 223
  • [29] SURFACE-CHEMISTRY OF ALKYL AMINES .1. ETHYLAMINE AND TRIETHYLAMINE ON W(100), W(100)-(5 X 1)-C, AND W(100)-(2 X 1)-O
    PEARLSTINE, KA
    FRIEND, CM
    JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1986, 108 (19) : 5837 - 5842
  • [30] Complex thermal chemistry of vinyltrimethylsilane on Si(100)-2 x 1
    Pirolli, L
    Teplyakov, AV
    JOURNAL OF PHYSICAL CHEMISTRY B, 2005, 109 (17): : 8462 - 8468