Layer-by-layer deposition of zirconia thin films from aqueous solutions

被引：8
|
作者：
Arcot, Pavan K. [1 ]
Luo, Jian [1 ]
机构：
[1] Clemson Univ, Ctr Opt Mat Sci & Engn Technol, Sch Mat Sci & Engn, Clemson, SC 29634 USA
来源：
MATERIALS LETTERS | 2008年 / 62卷 / 01期
基金：
美国国家航空航天局; 美国国家科学基金会;
关键词：
thin films; deposition; surface; kinetics; oxide; layer-by-layer deposition;
D O I：
10.1016/j.matlet.2007.04.078
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Thin films of ZrO2 and Y2O3-doped ZrO2 were deposited using a novel yet simple layer-by-layer technique by means of electrostatic assembling and surface precipitation via dipping substrates alternately in cationic and anionic precursor solutions. Uniform films have been made. A constant growth rate of 5.4 +/- 0.3 nm per deposition cycle for the dehydrated nanocrystalline films was achieved. This generic technique can be adapted to make other oxide films and novel multilayers or functionally-graded coatings. (C) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码：117 / 120
页数：4
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