Monolithic Passive-Active Integration of Epitaxially Grown Quantum Dot Lasers on Silicon

被引:7
|
作者
Zhang, Zeyu [1 ]
Shang, Chen [2 ]
Norman, Justin C. [3 ]
Koscica, Rosalyn [2 ]
Feng, Kaiyin [1 ]
Bowers, John E. [1 ,2 ]
机构
[1] Univ Calif Santa Barbara, Elect & Comp Engn Dept, Santa Barbara, CA 93117 USA
[2] Univ Calif Santa Barbara, Mat Dept, Santa Barbara, CA 93117 USA
[3] Quintessent Inc, Santa Barbara, CA 93117 USA
关键词
laser epitaxy; photonic integration; quantum dot lasers; PHOTONICS; TEMPERATURE; THRESHOLD; DIFFUSION; DESIGN;
D O I
10.1002/pssa.202100522
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Quantum dot (QD) lasers epitaxially grown on Si have already been demonstrated to show record low threshold, high temperature tolerance, and low feedback sensitivity. When grown on the silicon photonic chip and integrated with Si waveguides (WGs), QD lasers offer considerable economical and foundry-scalable solutions to on-chip light sources. Yet, a technology that enables both growth and integration of QD lasers on a silicon photonic chip has not been demonstrated. Herein, a novel device platform which enables integration of the QD active region with passive WG structures is designed. By doing so, complex and high-performance lasers such as distributed Bragg reflector lasers, mode-locked lasers, and sampled grating distributed Bragg reflector tunable lasers are demonstrated in this platform. The same laser epitaxial stack can be easily grown on the substrate of a silicon photonic chip to allow light coupling from QD laser cavities to the silicon WGs.
引用
收藏
页数:23
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