C-V characterization of nonlinear capacitors using CBCM method

被引:0
|
作者
Sutory, T. [1 ]
Kolka, Z. [1 ]
机构
[1] Brno Univ Technol, Dept Radio Elect, Brno 61200, Czech Republic
关键词
charge-based capacitance measurements; MOS characterization; test structures;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The paper deals with a modification of CBCM (Charge-Based Capacitance Measurements) for nonlinear capacitance characterization. The method is characterized by high resolution although it is based on equipment found in any average laboratory. CBCM was originally developed for linear interconnect measurements. The proposed modification uses two DC swept sources to measure the whole nonlinear Q-v characteristic in both polarities without the necessity to switch the measured object. A test-chip implementing the method was designed and manufactured in 0.35 mu m CMOS process. Verification against known capacitances proved the method correctness and accuracy. It was successfully used for MOSCAPs characterization in full operating voltage range.
引用
收藏
页码:501 / 505
页数:5
相关论文
共 50 条
  • [31] Characterization of ultra-thin oxides using electrical C-V and I-V measurements
    Hauser, JR
    Ahmed, K
    CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY, 1998, 449 : 235 - 239
  • [32] GACV: Geodesic-aided C-V method
    Chen, Li
    Zhou, Yue
    Wang, Yonggang
    Yang, Jie
    PATTERN RECOGNITION, 2006, 39 (07) : 1391 - 1395
  • [33] Effect of traps-to-gate tunnel communication on C-V characteristics of MIS capacitors
    Mazurak, A.
    Jasinski, J.
    Majkusiak, B.
    MICROELECTRONIC ENGINEERING, 2019, 215
  • [34] A novel color C-V method and its application
    Chen, L
    Zhou, Y
    Wang, YG
    IMAGE ANALYSIS AND RECOGNITION, 2005, 3656 : 40 - 47
  • [35] NUMERICAL-CALCULATION OF IDEAL C-V CHARACTERISTICS OF NONUNIFORMLY DOPED MOS CAPACITORS
    ELSISSI, H
    COBBOLD, RSC
    ELECTRONICS LETTERS, 1973, 9 (25) : 594 - 596
  • [36] Analytical model for C-V characteristic of fully depleted SOI-MOS capacitors
    Afzal, B
    Zahabi, A
    Amirabadi, A
    Koolivand, Y
    Afzali-Kusha, A
    El Nokali, M
    SOLID-STATE ELECTRONICS, 2005, 49 (08) : 1262 - 1273
  • [37] Novel highly tunable mems capacitors with flexible structure and linear C-V response
    Shavezipur, Mohammad
    Hashemi, Seyed Mohammad
    Khajepour, Amir
    19TH INTERNATIONAL CONFERENCE ON DESIGN THEORY AND METHODOLOGY/1ST INTERNATIONAL CONFERENCE ON MICRO AND NANO SYSTEMS, VOL 3, PART A AND B, 2008, : 949 - 955
  • [38] THE INFLUENCE OF THE OUTER OXIDE SURFACE CONDITIONS OF MIS CAPACITORS ON THE SHAPE OF THEIR C-V CURVES
    VITANOV, PK
    KAMENOVA, M
    SOTIROVA, MS
    THIN SOLID FILMS, 1980, 70 (01) : L5 - L7
  • [39] Influence of gamma irradiation on the C-V characteristics of the Al/SiNx/Si MIS capacitors
    Tugay, Evrin
    Yilmaz, Ercan
    Turan, Rasit
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2012, 30 (04):
  • [40] NON-EQUILIBRIUM C-V AND I-V CHARACTERISTICS OF METAL-INSULATOR-SEMICONDUCTOR CAPACITORS
    HIELSCHER, FH
    PREIER, HM
    SOLID-STATE ELECTRONICS, 1969, 12 (07) : 527 - +