ADSORPTION OF NITROGEN OXIDE MOLECULES TO THE SURFACE OF NANOSIZED NICKEL CLUSTERS FORMED ON THE (111) SURFACE OF A MAGNESIUM OXIDE FILM

The properties of the systems formed on deposition of Ni atoms on the (111) surface of a MgO film of thickness equal to six monomolecular layers grown on a Mo(110) crystal face and the adsorption of NO nitrogen oxide molecules to the system surface have been studied by methods of electron spectroscopy (AES, XPES, LEED, LEIBSS) and reflective infrared absorption spectroscopy. On deposition of Ni atoms on the surface of MgO at a substrate temperature of 600 K, three-dimensional islands of Ni are formed. The subsequent adsorption of NO results in molecule dissociation even at 110 K. The efficiency of this process depends on the morphology of the Ni layer.