Fabrication and characterization of a CeO2 buffer layer on c-plane and tilt-c-plane sapphire substrates

被引:6
|
作者
Shirakawa, M [1 ]
Unno, J [1 ]
Aizawa, K [1 ]
Kusunoki, M [1 ]
Mukaida, M [1 ]
Ohshima, S [1 ]
机构
[1] Yamagata Univ, Fac Engn, Yonezawa, Yamagata 9928510, Japan
关键词
c-plane sapphire; tilt-c-plane sapphire; CeO2 thin films; in-plane orientation;
D O I
10.1016/S0921-4534(03)00993-6
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have examined in-plane orientation Of CeO2 buffer layers on c-plane and tilt-c-plane sapphire substrates. The tilt angles are 5degrees, 10degrees and 15degrees, which are defined as the angles between the c-plane and the surface planes of the sapphire substrates (called 5degrees, 10degrees, 15degrees tilt-c-plane substrates). The films were prepared by inductively coupled plasma sputtering. The in-plane orientation of the films was measured using X-ray phi-scan. phi-scan peaks of films fabricated on c-plane substrates appeared every npi/6 or npi/12 (n: integer), showing 12-fold or 24-fold symmetry. The in-plane orientation is influenced by the hexagonal symmetry of the sapphire c-plane. The degree of film orientation depends on the substrate temperature during preparation. On the other hand, we found weak 4-fold symmetry for films fabricated on 10degrees and 15degrees. tilt-c-plane substrates. This suggests that we can obtain CeO2 films with perfect 4-fold symmetry on tilt-c-plane sapphire substrates. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:1346 / 1352
页数:7
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