Strain enhanced defect reactivity at grain boundaries in polycrystalline graphene

被引:74
|
作者
Wang, Bin [1 ]
Puzyrev, Yevgeniy [1 ]
Pantelides, Sokrates T. [1 ,2 ,3 ]
机构
[1] Vanderbilt Univ, Dept Phys & Astron, Nashville, TN 37235 USA
[2] Vanderbilt Univ, Dept Elect Engn & Comp Sci, Nashville, TN 37235 USA
[3] Oak Ridge Natl Lab, Oak Ridge, TN 37831 USA
关键词
CHEMICAL-VAPOR-DEPOSITION; EPITAXIAL GRAPHENE; MOLECULAR-DYNAMICS; LARGE-AREA; FILMS; TRANSPORT;
D O I
10.1016/j.carbon.2011.05.038
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Grain boundaries dominate the property of polycrystalline graphene. We report first-principles calculations and classical molecular dynamics simulations that reveal enhanced defect reactivity induced by an inhomogeneous strain field at grain boundaries. Strained carbon bonds located at heptagons and pentagons can accumulate interstitials and single vacancies, respectively. We find that recombination of vacancies and interstitials can occur locally at grain boundaries, which serve as effective sinks, resulting in efficient annealing of defects. The enhanced defect reactivity indicates that grain boundaries may be manipulated by point defects. (C) 2011 Elsevier Ltd. All rights reserved.
引用
收藏
页码:3983 / 3988
页数:6
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