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Photodetachment of H- near a partially reflecting surface-I
被引:4
|作者:
Afaq, A.
[1
]
机构:
[1] COMSATS Inst Informat Technol, Dept Phys, Lahore, Pakistan
关键词:
D O I:
10.1088/0256-307X/25/2/034
中图分类号:
O4 [物理学];
学科分类号:
0702 ;
摘要:
Theoretical and interpretative study on the subject of photodetachment of H- near a partially reflecting surface is presented, and the absorption effect of the surface is investigated on the total and differential cross sections using a theoretical imaging method. To understand the absorption effect, a reflection parameter K is introduced as a multiplicative factor to the outgoing detached-electron wave of H- propagating towards the wall. The reflection parameter measures, how much electron wave would reflect from the surface; K = 0 corresponds to no reflection and K = 1 corresponds to the total reflection.
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页码:475 / 478
页数:4
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