Preparation of Ti-Al alloy sheet by electron beam physical vapor deposition

被引:0
|
作者
Ma Li [1 ]
He Xiao-Dong [1 ]
Sun Yue [1 ]
机构
[1] Harbin Inst Technol, Ctr Composite Mat, Harbin 150001, Peoples R China
关键词
electron beam physical vapor deposition; Ti-Al thin sheet; microstructure; saturation vapor pressure; re-evaporation;
D O I
暂无
中图分类号
TF [冶金工业];
学科分类号
0806 ;
摘要
Ti-Al thin sheet with dimension of 450 mm x 450 mm x 0.2 mm was prepared by electron beam physical vapor deposition(EB-PVD) technology. The surface and cross-section pattern of as-deposited sample were studied by SEM and AFM, and then the composition and phase were analysed by XRD and EPMA. Finally, the effect on deposit by re-evaporation of Al was explored by calculating the ratio of re-evaporating capacity with depositing capacity of Al on the substrate. The results indicate that the evaporation process with Nb addition into the molten pool makes it earlier to reach the steady-state. The existing equiaxed crystal and columnar crystal along the cross-sectional may be caused by the transformation latent heat released during the transition course of atoms from gaseous state to solid state. The effect on deposit by re-evaporation of Al can be neglected because the re-evaporating capacity of Al is far below that of the depositing capacity.
引用
收藏
页码:S477 / S481
页数:5
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