A new photoelastic approach to determine stress intensity factors

被引：0
|
作者：
Li, XF [1 ]
Fan, TY [1 ]
机构：
[1] Beijing Inst Technol, Res Ctr Mat Sci, Beijing 100081, Peoples R China
来源：
INTERNATIONAL JOURNAL OF FRACTURE | 1998年 / 91卷 / 01期
关键词：
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A new approach, in which the only information is the area of isochromatic fringe loop, is presented to determine mode-I and mode-II stress intensity factors(SIFs). For a mixed-mode crack, the expressions for SIFs K-I and K-II in terms of the area inside an isochromatic fringe loop and the area inside an iso-sum fringe loop are given. A comparison of the present results with the previous results shows that the proposed method is stable and efficient.
引用
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页码：L3 / L8
页数：6
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