A new photoelastic approach to determine stress intensity factors

被引:0
|
作者
Li, XF [1 ]
Fan, TY [1 ]
机构
[1] Beijing Inst Technol, Res Ctr Mat Sci, Beijing 100081, Peoples R China
关键词
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A new approach, in which the only information is the area of isochromatic fringe loop, is presented to determine mode-I and mode-II stress intensity factors(SIFs). For a mixed-mode crack, the expressions for SIFs K-I and K-II in terms of the area inside an isochromatic fringe loop and the area inside an iso-sum fringe loop are given. A comparison of the present results with the previous results shows that the proposed method is stable and efficient.
引用
收藏
页码:L3 / L8
页数:6
相关论文
共 50 条