MFC design for semiconductor processing using computational fluid dynamics

被引：0
|
作者：
McDonald, R. Mike
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来源：
SOLID STATE TECHNOLOGY | 2007年 / 50卷 / 11期
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Mass flow controller (MFC) designs must evolve to meet the need for ever more precise control of chemical and gas precursors used in semiconductor manufacturing. The flow-bypass thermal MFC technology that has been proven over decades of use can be extended to atomic-layer deposition (ALD) processes that ultimately specify chemicals in terms of moles/pulse instead of cubic-centimeters/min. Computational fluid dynamics (CFD) modeling can reduce hardware development time by cutting the number of iterations needed to handle nonlinearities in sensors and hysteresis in valves.
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页码：32 / +
页数：3
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