Optimization of a minienvironment design using computational fluid dynamics

被引:0
|
作者
Tannous, George A. [1 ]
机构
[1] Asyst Technologies, Inc, Fremont, United States
来源
Journal of the IES | 1997年 / 40卷 / 01期
关键词
Air quality - Clean rooms - Computational fluid dynamics - Contamination - Finite volume method - Flow of fluids - Geometry - Mathematical models - Optimization - Pressure - Semiconductor device manufacture;
D O I
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中图分类号
学科分类号
摘要
This paper discusses the use of a CFD (computational fluid dynamics) code for the design and optimization processes of a minienvironment mounted on a wafer process tool. The three-dimensional code was used to predict the air velocity field and pressure distribution in the minienvironment based on a finite volume approach. The geometric model consists of the minienvironment, the tool surface, and the integrated I/O Indexer interfaces. The airflow in the minienvironment (with a conceptual design configuration) was simulated. The results prompted a design change. The new design has a desirable airflow for a more effective minienvironment performance. Particular attention was paid to air recirculation zones that could potentially trap particles generated during the process and to maintaining a positive differential pressure to prevent cross contamination. CFD was shown to be an important step in the design process.
引用
收藏
页码:29 / 34
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