Minimizing Stiction of Microelectromechanical Systems (MEMS) Through Solution-Phase Surface Modification with Alcohols

This article demonstrates implementation of solutionphased formation of alcohol based monolayers as a means to minimize stiction of microelectromechanical systems (MEMS). Surface modifications to a variety of metal and semiconductors have been attempted to reduce mechanical stiction of overhanging structures in MEMS devices. Issues associated with stiction arise from either the release of sacrificial layers during fabrication processes (i.e., release stiction), or the interactions of surfaces during subsequent device operation (i.e., in-use stiction). To address both release and in-use stiction, we propose a new approach that enables the release of sacrificial structures and formation of organic based monolayers on microscale structures. In this approach, unlike traditional approaches, the entire process is performed in solution-phase, and the structure(s) remain in solution until they are fully coated with covalently attached alcohol based monolayers. This approach minimizes the release stiction caused by surface tension during drying processes. The approach is also easily scalable and implementable in laboratory or industrial settings since it utilizes widely prevalent solvents that can be easily accessed and handled without the need for meticulous control over environmental humidity.