Polaron absorption in amorphous tungsten oxide films

被引:72
|
作者
Berggren, L [1 ]
Azens, A [1 ]
Niklasson, GA [1 ]
机构
[1] Uppsala Univ, Angstrom Lab, Dept Mat Sci, SE-75121 Uppsala, Sweden
关键词
D O I
10.1063/1.1384853
中图分类号
O59 [应用物理学];
学科分类号
摘要
Amorphous thin films of tungsten oxide were deposited by sputtering onto glass substrates covered by conductive indium-tin oxide. The density and stoichiometry were determined by Rutherford backscattering spectrometry. Lithium ions were intercalated electrochemically into the films. The optical reflectance and transmittance were measured in the wavelength range from 0.3 to 2.5 mum, at a number of intercalation levels. The polaron absorption peak becomes more symmetric and shifts to higher energies until an intercalation level of 0.25 to 0.3 Li+/W, where a saturation occurs. The shape of the polaron peak is in very good agreement with the theory of Bryksin [Fiz. Tverd. Tela 24, 1110 (1982)]. Within this model, the shift of the absorption peak is interpreted as an increase in the Fermi level of the material as more Li ions are inserted. (C) 2001 American Institute of Physics.
引用
收藏
页码:1860 / 1863
页数:4
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