Transport and reaction in inductively coupled plasmas for microelectronics

被引：0
|
作者：
Economou, DJ [1 ]
Feldsien, J [1 ]
Wise, RS [1 ]
机构：
[1] Univ Houston, Dept Chem Engn, Plasma Proc Lab, Houston, TX 77204 USA
来源：
ELECTRON KINETICS AND APPLICATIONS OF GLOW DISCHARGES | 1998年 / 367卷
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D O I：
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中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：367 / 390
页数：24
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