Analog and RF performance of doping-less tunnel FETs with Si0.55Ge0.45 source

被引:0
|
作者
Anand, Sunny [1 ]
Sarin, R. K. [1 ]
机构
[1] Dr BR Ambedkar Natl Inst Technol, Dept Elect & Commun Engn, Jalandhar, Punjab, India
关键词
Charge plasma; Doping less TFET (DLTFET); Band to band tunneling (BTBT); Si0.55Ge0.45-source DLTFET; Analog parameters; FIELD-EFFECT TRANSISTOR; LAYER; SIGE;
D O I
10.1007/s10825-016-0859-5
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reports studies of a doping-less tunnel field-effect transistor (TFET) with a Si0.55Ge0.45 source structure aimed at improving the performance of charge-plasma-based doping-less TFETs. The proposed device achieves an improved ON-state current ( ION similar to 4.88 x 10(-5) A/mu m), an I-ON/I-OFF ratio of 6.91 x 10(12), an average subthreshold slope (AV-SS) of similar to 64.79mV/dec, and a point subthreshold slope (SS) of 14.95 mV/dec. This paper compares the analog and radio of frequency (RF) parameters of this device with those of a conventional doping-less TFET (DLTFET), including the transconductance (gm), transconductance-to-drain-current ratio (g(m)/I-D), output conductance (g(d)), intrinsic gain (A(V)), early voltage (VEA), total gate capacitance (C-gg), and unity-gain frequency (fT). Based on the simulated results, the Si0.55Ge0.45-source DLTFET is found to offer superior analog as well as RF performance.
引用
收藏
页码:850 / 856
页数:7
相关论文
共 50 条
  • [1] Analog and RF performance of doping-less tunnel FETs with Si0.55Ge0.45\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$\hbox {Si}_{0.55} \hbox {Ge}_{0.45}$$\end{document} source
    Sunny Anand
    R. K. Sarin
    Journal of Computational Electronics, 2016, 15 (3) : 850 - 856
  • [2] Fabrication and Analysis of a Si/Si0.55Ge0.45 Heterojunction Line Tunnel FET
    Walke, Amey M.
    Vandooren, Anne
    Rooyackers, Rita
    Leonelli, Daniele
    Hikavyy, Andriy
    Loo, Roger
    Verhulst, Anne S.
    Kao, Kuo-Hsing
    Huyghebaert, Cedric
    Groeseneken, Guido
    Rao, Valipe Ramgopal
    Bhuwalka, Krishna K.
    Heyns, Marc M.
    Collaert, Nadine
    Thean, Aaron Voon-Yew
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2014, 61 (03) : 707 - 715
  • [3] Si0.5Ge0.5 Single and Hetero-gate dielectric Doping-less Tunnel FETs
    Naik, Vinod
    Chauhan, Sudakar Singh
    2016 INTERNATIONAL CONFERENCE ON COMMUNICATION AND SIGNAL PROCESSING (ICCSP), VOL. 1, 2016, : 635 - 638
  • [4] Total Ionizing Dose Effects on Ge Channel pFETs with Raised Si0.55Ge0.45 Source/Drain
    Wang, Liang
    Zhang, En Xia
    Schrimpf, Ronald D.
    Fleetwood, Daniel M.
    Duan, Guo Xing
    Hachtel, Jordan A.
    Zhang, Cher Xuan
    Reed, Robert A.
    Samsel, Isaak K.
    Alles, Michael L.
    Witters, Liesbeth
    Collaert, Nadine
    Linten, Dimitri
    Mitard, Jerome
    Chisholm, Matthew F.
    Pantelides, Sokrates T.
    Galloway, Kenneth F.
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2015, 62 (06) : 2412 - 2416
  • [5] Fabrication of strained Si0.55Ge0.45 channel PMOSFETs directly on a Si substrate
    Zhao, Tiexiang
    Liang, Rengrong
    Tan, Zhen
    Wang, Jing
    Xu, Jun
    2013 IEEE INTERNATIONAL CONFERENCE OF ELECTRON DEVICES AND SOLID-STATE CIRCUITS (EDSSC), 2013,
  • [6] A Doping-Less Tunnel Field-Effect Transistor with Si0.6Ge0.4 Heterojunction for the Improvement of the On-Off Current Ratio and Analog/RF Performance
    Han, Tao
    Liu, Hongxia
    Chen, Shupeng
    Wang, Shulong
    Li, Wei
    ELECTRONICS, 2019, 8 (05):
  • [7] Analog performance investigation of dual electrode based doping-less tunnel FET
    Sunny Anand
    S. Intekhab Amin
    R. K. Sarin
    Journal of Computational Electronics, 2016, 15 : 94 - 103
  • [8] Gate misalignment effects on analog/RF performance of charge plasma-based doping-less tunnel FET
    Sunny Anand
    R. K. Sarin
    Applied Physics A, 2017, 123
  • [9] Impact of Oxide Engineering on Analog/RF Performance of Doping-Less DMDG MOSFET
    Gupta, Abhinav
    Kumar, Amrish
    Rai, Sanjeev
    Tripathi, Rajeev
    ADVANCES IN VLSI, COMMUNICATION, AND SIGNAL PROCESSING, 2020, 587 : 557 - 567
  • [10] Dual material gate doping-less tunnel FET with hetero gate dielectric for enhancement of analog/RF performance
    Sunny Anand
    R.K.Sarin
    Journal of Semiconductors, 2017, 38 (02) : 35 - 41