Thermoreflectance Imaging Measurement of In-plane Thermal Properties of Thin-film Structures

被引：1

作者：

Wang, Xi ^{[1
]}

Shakouri, Ali ^{[1
]}

Mavrokefalos, Anastassios ^{[2
]}

Lee, Yong ^{[2
]}

Kong, Huijun ^{[2
]}

Shi, Li ^{[2
]}

机构：

[1] Univ Calif Santa Cruz, Dept Elect Engn, 1156 High St, Santa Cruz, CA 95064 USA

[2] Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA

来源：

26TH ANNUAL IEEE SEMICONDUCTOR THERMAL MEASUREMENT AND MANAGEMENT SYMPOSIUM, PROCEEDINGS 2010 | 2010年

关键词：

Thin film; In-plane thermal conductivity; thermoreflectance; 3-OMEGA METHOD; CONDUCTIVITY;

D O I：

10.1109/STHERM.2010.5444284

中图分类号：

O414.1 [热力学];

学科分类号：

摘要：

The study of thin film thermal properties is an important component of microelectronic and thermoelectric material research. Accurate measurements of such properties, especially in-plane thermal conductivity is known to be challenging. In this paper, we briefly review the thin film in-plane thermal conductivity measurement methods that have been developed up to date, and demonstrate a new method with the utilization of thermoreflectance imaging technique. Preliminary measurement results for an InAlGaAs thin film sample are described.

引用

页码：235 / 239

页数：5

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