Surface characteristics of indium-tin oxide cleaned by remote plasma

被引：6

作者：

Kim, S ^{[1
]}

Seo, H

Kim, Y

Kim, K

Tak, Y

Jeon, H

机构：

[1] Hanyang Univ, Div Engn & Mat Sci, Seoul 133791, South Korea

[2] N Carolina State Univ, Dept Elect & Comp Engn, Raleigh, NC 27695 USA

[3] Pusan Natl Univ, Sch Mat Sci & Engn, Pusan 609735, South Korea

[4] LG Elect, LG Elect Inst Technol, OLED Div, Kumi 730030, South Korea

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2005年 / 44卷 / 02期

关键词：

ITO; remote plasma; contaminants; work function; sheet resistance;

D O I：

10.1143/JJAP.44.1041

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We investigated the remote oxygen and hydrogen plasma cleaning of indium-fin oxide and its surface electronic properties. Samples cleaned by hydrogen plasma after oxygen plasma cleaning showed the complete absence of surface contaminants while samples cleaned by only hydrogen or oxygen plasma showed some residual contaminants. Work function is mainly affected by oxygen plasma treatments while sheet resistance is more closely related to the removal of surface carbon contaminants. This study revealed that surface dipoles due to the O(-) ions are believed to have a more significant contribution to the change in work function than the reduction of Sn(4+).

引用

页码：1041 / 1044

页数：4

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