Chemical deposition of diamond in the C-H-F, C-O-F, and C-H-O-F systems

被引：0
|
作者：
Rakov, EG [1 ]
Modin, AV [1 ]
机构：
[1] DI Mendeleev Chem Technol Univ, Moscow, Russia
来源：
ZHURNAL FIZICHESKOI KHIMII | 1998年 / 72卷 / 09期
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D O I：
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中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
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页码：1693 / 1697
页数：5
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