Recent developments in vacuum arc deposition

被引：34
|
作者：
Boxman, RL [1 ]
机构：
[1] Tel Aviv Univ, Fleischman Fac Engn, Elect Discharge & Plasma Lab, IL-69978 Tel Aviv, Israel
来源：
IEEE TRANSACTIONS ON PLASMA SCIENCE | 2001年 / 29卷 / 05期
关键词：
cathodic arc; coatings; filtered vacuum arc; thin films; vacuum arc;
D O I：
10.1109/27.964471
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
Vacuum arc deposition (VAD) has become an established industrial art for producing hard, wear-resistant and decorative coatings. Sophisticated coatings, including tertiary compounds and multilayers, are increasingly used. Filtered VAD and hot electrode vacuum arcs are increasingly investigated to obtain high-quality, macroparticle-free films. Improved filtered sources, including large rectangular filters, have been demonstrated. Besides tool coatings, films for metallizing integrated circuits and protecting magnetic media are being developed.
引用
收藏
页码：762 / 767
页数：6
相关论文
共 50 条
  • [41] Recent ARC developments: through modularity to interoperability
    Smirnova, O.
    Cameron, D.
    Dobe, P.
    Ellert, M.
    Fragat, T.
    Gronager, M.
    Johansson, D.
    Jonemo, J.
    Kleist, J.
    Kocan, M.
    Konstantinov, A.
    Konya, B.
    Marton, I.
    Moeller, S.
    Mohn, B.
    Nagy, Zs
    Nilsen, J. K.
    Saada, F. Ould
    Qiang, W.
    Read, A.
    Rosendahl, P.
    Roczei, G.
    Savko, M.
    Andersen, M. Skou
    Stefan, P.
    Szalai, F.
    Taga, A.
    Toor, S. Z.
    Waananen, A.
    17TH INTERNATIONAL CONFERENCE ON COMPUTING IN HIGH ENERGY AND NUCLEAR PHYSICS (CHEP09), 2010, 219
  • [42] RECENT DEVELOPMENTS IN ELECTRIC ARC FURNACE TECHNOLOGY
    LANDRY, ER
    CANADIAN MINING AND METALLURGICAL BULLETIN, 1967, 60 (664): : 923 - &
  • [43] Recent advances in vacuum arc ion sources
    Brown, I.G.
    Anders, A.
    Anders, S.
    Dickinson, M.R.
    MacGill, R.A.
    Oks, E.M.
    Surface and Coatings Technology, 1996, 84 (1 -3 pt 2): : 550 - 556
  • [44] VACUUM-ARC ION SOURCES - SOME VACUUM-ARC BASICS AND RECENT RESULTS
    ANDERS, S
    ANDERS, A
    BROWN, I
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1994, 65 (04): : 1253 - 1258
  • [45] VACUUM EVAPORATION - HISTORY, RECENT DEVELOPMENTS AND APPLICATIONS
    BUNSHAH, RF
    ZEITSCHRIFT FUR METALLKUNDE, 1984, 75 (11): : 840 - 846
  • [46] Recent Developments in the Vacuum Preloading Technique in China
    Zhou, You
    Chen, Shuli
    Guo, Wei
    Ren, Yuxiao
    Xu, Guizhong
    SUSTAINABILITY, 2022, 14 (21)
  • [47] Deposition of superhard amorphous carbon films by pulsed vacuum arc deposition
    Schultrich, B
    Scheibe, HJ
    Drescher, D
    Ziegele, H
    SURFACE & COATINGS TECHNOLOGY, 1998, 98 (1-3): : 1097 - 1101
  • [48] Copper film deposition rates by a hot refractory anode vacuum arc and magnetically filtered vacuum arc
    Shashuirin, A.
    Beilis, I. I.
    Sivan, Y.
    Goldsmith, S.
    Boxman, R. L.
    SURFACE & COATINGS TECHNOLOGY, 2006, 201 (07): : 4145 - 4151
  • [49] PRESSURE LIMITS FOR THE VACUUM-ARC DEPOSITION TECHNIQUE
    MEUNIER, JL
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 1990, 18 (06) : 904 - 910
  • [50] Deposition of CrN coatings by filtered cathodic vacuum arc
    Mo, J. L.
    Zhu, M. H.
    An, J.
    Sun, H.
    Leng, Y. X.
    Huang, N.
    SURFACE ENGINEERING (ICSE 2007), 2008, 373-374 : 130 - 133
12345