Thermal stability studies of ion beam sputter deposited C/B4C X-ray multilayer mirror

被引：5
|
作者：
Rao, P. N. [1 ]
Modi, M. H. [1 ]
Rai, S. K. [1 ]
Sathe, V. G. [2 ]
Deb, S. K. [1 ]
Lodha, G. S. [1 ]
机构：
[1] Raja Ramanna Ctr Adv Technol, Ind Synchrotrons Utilizat Div, Xray Opt Sect, Indore 452013, Madhya Pradesh, India
[2] UGC DAE Consortium Sci Res, Indore 452001, Madhya Pradesh, India
来源：
THIN SOLID FILMS | 2013年 / 527卷
关键词：
X-ray multilayer; Thermal stability; Soft X-ray reflectivity; Raman spectroscopy; X-ray optics; Synchrotron radiation; INDUCED STRUCTURAL MODIFICATION; EXTREME-ULTRAVIOLET; PHOTOABSORPTION; METAL/AL2O3; REFLECTION; SCATTERING; OPTICS; FILMS; OXIDE;
D O I：
10.1016/j.tsf.2012.12.033
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We report the results of thermal stability study carried out on C/B4C multilayer structure. We have analyzed the structure of as-deposited and vacuum annealed C/B4C multilayer film by soft X-ray reflectivity measurements. We observed that multilayer period expansion continues till 600 degrees C and slight contraction at higher annealing temperature. The results show that the multilayer structure is stable even after 700 degrees C annealing. Raman spectroscopy indicates graphitization of carbon layerwith increasing annealing temperature. Graphitization of carbon results in increases of layer thickness and decreases in density as also observed by soft X-ray reflectivity. We observed reduction in measured soft X-ray reflectivity at 6.56 and 4.39 nm wavelengths after 800 degrees C annealing. C/B4C multilayer structure has been tested over a period of one year to investigate its temporal stability. (C) 2012 Elsevier B. V. All rights reserved.
引用
收藏
页码：244 / 249
页数：6
相关论文
共 50 条
  • [21] Thermal stability of the Mo-B4C and Mo2B5-B4C multilayer X-ray mirrors
    Kopylets, IA
    Kondratenko, VV
    Fedorenko, AI
    METALLOFIZIKA I NOVEISHIE TEKHNOLOGII, 1997, 19 (06): : 61 - 65
  • [22] Damages to B4C/W multilayer mirrors by intense soft x-ray bursts
    LeGuern, F
    Troussel, P
    Andre, JM
    Friart, D
    Jalinaud, T
    leGloahec, MR
    Desenne, D
    Boutin, JY
    Dutrannoy, JL
    Nazet, C
    Davi, P
    Barchewitz, R
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1996, 67 (06): : 2107 - 2110
  • [23] Thermal stability of 2.4 nm period Ni-Nb/C multilayer x-ray mirror
    Vitta, S
    Yang, P
    APPLIED PHYSICS LETTERS, 2000, 77 (22) : 3654 - 3656
  • [24] Soft X-ray reflectivity and thermal stability of CoCr/C multilayer X-ray mirrors
    Takenaka, H
    Nagai, K
    Ito, H
    Ichimaru, S
    Sakuma, T
    Namikawa, K
    Muramatsu, Y
    Gullikson, E
    Perera, CC
    SURFACE REVIEW AND LETTERS, 2002, 9 (01) : 593 - 596
  • [25] Thermal stability of Mo/C/Si/C multilayer soft x-ray mirrors
    Takenaka, H
    Kawamura, T
    JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1996, 80 : 381 - 384
  • [26] Thermal stability of Mo/C/Si/C multilayer soft X-ray mirrors
    NTT Interdisc. Research Laboratories, 3-9-11, Midori-cho, Musashino-shi, Tokyo 180, Japan
    J Electron Spectrosc Relat Phenom, (381-384):
  • [27] Reduction of stress and roughness by reactive sputtering in W/B4C X-ray multilayer films
    Windt, David L.
    OPTICS FOR EUV, X-RAY, AND GAMMA-RAY ASTRONOMY III, 2007, 6688 : R6880 - R6880
  • [28] Ion beam sputter deposition of x-ray multilayer optics on large areas
    Gawlitza, Peter
    Braun, Stefan
    Lipfert, Sebastian
    Leson, Andreas
    ADVANCES IN X-RAY/EUV OPTICS, COMPONENTS, AND APPLICATIONS, 2006, 6317
  • [29] Microstructure and mechanical properties of B4C films deposited by ion beam sputtering
    Zhou, M. J.
    Wong, S. F.
    Ong, C. W.
    Li, Quan
    THIN SOLID FILMS, 2007, 516 (2-4) : 336 - 339
  • [30] X-ray properties and interface study of B4C/Mo and B4C/Mo2C periodic multilayers
    F. Choueikani
    F. Bridou
    B. Lagarde
    E. Meltchakov
    F. Polack
    P. Mercere
    F. Delmotte
    Applied Physics A, 2013, 111 : 191 - 198
12345