In this paper, the effect of an applied electric field on fracture toughness of polarized GaN piezoelectric semiconductor ceramics was studied by using experimental and numerical methods. The results show that fracture toughness increases by 22% under a field intensity of 0.83 kV cm(-1), and with further increase of the electrical filed, fracture toughness remains unchanged. This is completely different from the fracture characteristics of traditional piezoelectric ceramics that is thought to decrease with an applied electric field. The reason for such a difference is attributed to the redistribution of free electrons. It is expected that this finding will be instructive to the reliability design of piezoelectric semiconductor structures and devices.
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Shanghai Normal Univ, Key Lab Optoelect Mat & Device, Dept Phys, Shanghai 200234, Peoples R ChinaShanghai Normal Univ, Key Lab Optoelect Mat & Device, Dept Phys, Shanghai 200234, Peoples R China
Yao, Qirong
Wang, Feifei
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Shanghai Normal Univ, Key Lab Optoelect Mat & Device, Dept Phys, Shanghai 200234, Peoples R China
Univ Sydney, CAMT, Sch Aerosp Mech & Mech Engn, Sydney, NSW 2006, AustraliaShanghai Normal Univ, Key Lab Optoelect Mat & Device, Dept Phys, Shanghai 200234, Peoples R China
Wang, Feifei
Xu, Feng
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Northwestern Polytech Univ, Sch Aeronaut, Xian 710072, Shanxi, Peoples R ChinaShanghai Normal Univ, Key Lab Optoelect Mat & Device, Dept Phys, Shanghai 200234, Peoples R China
Xu, Feng
Leung, Chung Ming
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Hong Kong Polytech Univ, Dept Elect Engn, Kowloon, Hong Kong, Peoples R ChinaShanghai Normal Univ, Key Lab Optoelect Mat & Device, Dept Phys, Shanghai 200234, Peoples R China
Leung, Chung Ming
Wang, Tao
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Shanghai Normal Univ, Key Lab Optoelect Mat & Device, Dept Phys, Shanghai 200234, Peoples R ChinaShanghai Normal Univ, Key Lab Optoelect Mat & Device, Dept Phys, Shanghai 200234, Peoples R China
Wang, Tao
Tang, Yanxue
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Shanghai Normal Univ, Key Lab Optoelect Mat & Device, Dept Phys, Shanghai 200234, Peoples R ChinaShanghai Normal Univ, Key Lab Optoelect Mat & Device, Dept Phys, Shanghai 200234, Peoples R China
Tang, Yanxue
Ye, Xiang
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Shanghai Normal Univ, Key Lab Optoelect Mat & Device, Dept Phys, Shanghai 200234, Peoples R ChinaShanghai Normal Univ, Key Lab Optoelect Mat & Device, Dept Phys, Shanghai 200234, Peoples R China
Ye, Xiang
Xie, Yiqun
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Shanghai Normal Univ, Key Lab Optoelect Mat & Device, Dept Phys, Shanghai 200234, Peoples R ChinaShanghai Normal Univ, Key Lab Optoelect Mat & Device, Dept Phys, Shanghai 200234, Peoples R China
Xie, Yiqun
Sun, Dazhi
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Shanghai Normal Univ, Key Lab Optoelect Mat & Device, Dept Phys, Shanghai 200234, Peoples R ChinaShanghai Normal Univ, Key Lab Optoelect Mat & Device, Dept Phys, Shanghai 200234, Peoples R China
Sun, Dazhi
Shi, Wangzhou
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Shanghai Normal Univ, Key Lab Optoelect Mat & Device, Dept Phys, Shanghai 200234, Peoples R ChinaShanghai Normal Univ, Key Lab Optoelect Mat & Device, Dept Phys, Shanghai 200234, Peoples R China