Effects of moisture barriers on resistive switching in Pt-dispersed SiO2 nanometallic thin films

被引:13
|
作者
Choi, Byung Joon [1 ]
Chen, I-Wei [1 ]
机构
[1] Univ Penn, Dept Mat Sci & Engn, Philadelphia, PA 19104 USA
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2013年 / 112卷 / 02期
基金
美国国家科学基金会;
关键词
Aluminum oxide - Atomic layer deposition - Moisture - Thin films - Alumina - Platinum compounds - Silica;
D O I
10.1007/s00339-013-7776-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Moisture invasion into memory devices can result in data loss and malfunctions in write/erase switching. Deteriorated uniformity and retention characteristics, and distorted switching hysteresis loops, are observed in moisture-attacked Pt-dispersed SiO2 nanometallic thin-film devices, and can be effectively prevented by coating the device with a nanoscale Al2O3 barrier layer grown by an atomic layer deposition method. The moisture-attacked devices exhibit evidence of cumulating ion current and ion potential with repeated switching. In contrast, a capped device with an extremely uniform and reproducible resistive switching behavior features a completely symmetric current-voltage curve expected for a purely electronic device.
引用
收藏
页码:235 / 239
页数:5
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