Wavefront aberration compensation of projection lens using clocking lens elements

被引:12
|
作者
Liu, ChunLai [1 ]
Huang, Wei [1 ]
Shi, Zhenguang [1 ]
Xu, Weicai [1 ]
机构
[1] Chinese Acad Sci, State Key Lab Appl Opt, Changchun Inst Opt Fine Mech & Phys, Changchun 130033, Jilin, Peoples R China
关键词
741.3 Optical Devices and Systems - 921.5 Optimization Techniques - 943.3 Special Purpose Instruments;
D O I
10.1364/AO.52.005398
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
For extremely high-performance lithographic lenses, the edge level accuracy of the manufacturing process and multicompensation strategies must be applied. Element clocking can be effectively used to compensate for the low-order figure errors of the elements. Considering that commercial optical software is usually incapable of obtaining good convergence for clocking optimization, this paper proposes a mathematical model of a lithographic lens containing the errors of a surface figure, after which a clocking optimization algorithm is programmed. A clocking optimization instance proving that the clocking optimization algorithm is capable of finding the optimized angle of elements and that clocking is an effective compensation strategy. The calculated accuracy of the proposed mathematic model was found to be acceptable for clocking optimization. (C) 2013 Optical Society of America
引用
收藏
页码:5398 / 5401
页数:4
相关论文
共 50 条
  • [31] Active compensation of thermal aberrations in lithographic projection lens
    Chen, Hua
    Su, Dongqi
    Sui, Yongxin
    Zhang, Mingchao
    Tian, Wei
    Yang, Huaijiang
    Zhang, Wei
    Guangxue Xuebao/Acta Optica Sinica, 2014, 34 (08):
  • [32] Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image
    Zhu, Boer
    Wang, Xiangzhao
    Li, Sikun
    Yan, Guanyong
    Shen, Lina
    Duan, Lifeng
    APPLIED OPTICS, 2016, 55 (12) : 3192 - 3198
  • [33] Comparison of wavefront aberration after cataract surgery with acrylic intraocular lens implantation
    Choi, J
    Kim, TI
    Tchah, H
    JOURNAL OF CATARACT AND REFRACTIVE SURGERY, 2005, 31 (02): : 324 - 329
  • [34] Wavefront aberration measurement in 157-nm high numerical aperture lens
    Kim, JH
    Suganaga, T
    Watanabe, K
    Kanda, N
    Itani, T
    OPTICAL MICROLITHOGRAPHY XVI, PTS 1-3, 2003, 5040 : 1408 - 1419
  • [35] Analytical analysis of the impact of polarization aberration of projection lens on lithographic imaging
    Shen, Lina
    Li, Sikun
    Wang, Xiangzhao
    Yan, Guanyong
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2015, 14 (04):
  • [36] High NA and low residual aberration projection lens for DUV scanner
    Matsuyama, T
    Shibazaki, Y
    Ohmura, Y
    Suzuki, T
    OPTICAL MICROLITHOGRAPHY XV, PTS 1 AND 2, 2002, 4691 : 687 - 695
  • [37] CORRECTION OF THE SPHERICAL-ABERRATION OF THE CTEM OBJECTIVE LENS USING A FOIL LENS
    KUZUYA, M
    HIBINO, M
    MARUSE, S
    ULTRAMICROSCOPY, 1984, 15 (03) : 233 - 238
  • [38] Self-compensation for trefoil aberration of symmetric dioptric microlithographic lens
    Peng, Wei-Jei
    Ho, Cheng-Fang
    Hsu, Wei-Yao
    OPTICAL SYSTEM ALIGNMENT, TOLERANCING, AND VERIFICATION XI, 2017, 10377
  • [39] Design and experiment of active compensation system for thermal aberration of lithographic lens
    Dong L.
    Cui Q.
    Li P.
    Zhao L.
    Guangxue Xuebao/Acta Optica Sinica, 2017, 37 (03):
  • [40] LENS PROJECTION
    STOCKING.EL
    INSTRUMENTATION TECHNOLOGY, 1968, 15 (06): : 4 - &