Electron beam emission characteristics from plasma focus devices

被引：0

作者：

Zhang, T ^{[1
]}

Patran, A ^{[1
]}

Wong, D ^{[1
]}

Hassan, SM ^{[1
]}

Springham, SV ^{[1
]}

Tan, TL ^{[1
]}

Lee, P ^{[1
]}

Lee, S ^{[1
]}

Rawat, RS ^{[1
]}

机构：

[1] Nanyang Technol Univ, Natl Inst Educ, Singapore, Singapore

来源：

DENSE Z-PINCHES | 2006年 / 808卷

关键词：

plasma focus; electron emission; FeCo thin film;

D O I：

暂无

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

In this paper we observed the characteristics of the electron beam emission from our plasma focus machine filling neon, argon, helium and hydrogen. Rogowski coil and CCD based magnetic spectrometer were used to obtain temporal and energy distribution of electron emission. And the preliminary results of deposited FeCo thin film using electron beam from our plasma focus device were presented.

引用

页码：235 / +

页数：2

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