The gas field ion source for finely focused ion beam systems

被引：0
|
作者：
Thompson, W [1 ]
Armstrong, A [1 ]
Etchin, S [1 ]
Percival, R [1 ]
Saxonis, A [1 ]
机构：
[1] MICRION CORP,PEABODY,MA 01960
来源：
ION-SOLID INTERACTIONS FOR MATERIALS MODIFICATION AND PROCESSING | 1996年 / 396卷
关键词：
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：687 / 693
页数：7
相关论文
共 50 条
  • [31] Stability Measurement of Neon Ion Beam Current Emitted from Supertip Gas Field Ion Source
    Suzuki, Yusuke
    Asai, Takayuki
    Nagai, Shigekazu
    Kajiwara, Kazuo
    Iwata, Tatsuo
    Hata, Koichi
    2012 25TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE (IVNC), 2012, : 320 - +
  • [32] FINELY FOCUSED ION-BEAM TECHNOLOGY IN III-V COMPOUND SEMICONDUCTORS
    HASHIMOTO, H
    MIYAUCHI, E
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 19-20 : 381 - 387
  • [33] A novel approach to gaseous field ion sources for focused ion beam applications
    Miller, MK
    Sijbrandij, SJ
    ULTRAMICROSCOPY, 1999, 79 (1-4) : 225 - 230
  • [34] Ion beam properties for ECR ion source injector systems
    Leitner, D.
    Winklehner, D.
    Strohmeier, M.
    JOURNAL OF INSTRUMENTATION, 2011, 6
  • [35] Influence of the inhomogeneity of a focused photon beam on the stability of the ion current in an ion source with an effusion molecular beam
    Michalak, L
    Markowski, A
    Felinska, H
    VACUUM, 1999, 53 (3-4) : 465 - 472
  • [36] BEAM INTERACTIONS IN A FOCUSED ION-BEAM SYSTEM WITH A LIQUID-METAL ION-SOURCE
    DEJAGER, PWH
    VIJGEN, LJ
    MICROELECTRONIC ENGINEERING, 1994, 23 (1-4) : 107 - 110
  • [37] Dy-Ni alloy metal ion source for focused ion beam implantation
    Melnikov, A
    Hillmann, M
    Kamphausen, I
    Oswald, W
    Stauche, P
    Wernhardt, R
    Wieck, AD
    VACUUM, 2002, 67 (02) : 249 - 251
  • [38] Fabrication of Josephson junctions by single line etching of Nb thin films utilizing nitrogen-gas-field ion-source focused ion beam
    Sudo, Shinya
    Akabori, Masashi
    Uno, Munenori
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2022, 61 (SB)
  • [39] A FOCUSED ION-BEAM VACUUM LITHOGRAPHY PROCESS COMPATIBLE WITH GAS SOURCE MOLECULAR-BEAM EPITAXY
    HARRIOTT, LR
    TEMKIN, H
    HAMM, RA
    WEINER, J
    PANISH, MB
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1467 - 1470
  • [40] Mini rf-driven ion sources for focused ion beam systems
    Jiang, X
    Ji, Q
    Chang, A
    Leung, KN
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2003, 74 (04): : 2288 - 2292
12345