Device modeling from first principles at the atomic level

被引：0

作者：

Chang, YC ^{[1
]}

机构：

[1] UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801

来源：

COMPOUND SEMICONDUCTORS 1995 | 1996年 / 145卷

关键词：

D O I：

暂无

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

We demonstrate that device modeling can be done with the use of planar Wannier functions directly constructed from first-principles, Example calculations for GaAs/AlAs heterostructures are illustrated. For a small-size superlattice, it is shown that the results obtained from using the planar Wannier functions are essentially identical to those obtained with the fully convergent plane-wave basis.

引用

页码：1175 / 1180

页数：6

共 50 条

[41] Adsorption of atomic oxygen on HfC and TaC (110) surface from first principles
Liu, Dongliang
Deng, Jianguo
Jin, Yongzhong
He, Cheng
APPLIED SURFACE SCIENCE, 2012, 261 : 214 - 218
[42] Atomic Level to Device Level Simulation of Transistor's Reliability
Liu, Yue-Yang
2024 INTERNATIONAL SYMPOSIUM OF ELECTRONICS DESIGN AUTOMATION, ISEDA 2024, 2024, : 42 - 43
[43] Atomic Partial Charges for Periodic Systems from First-Principles Calculations
Li Ya-Na
Lue Yang
Zhou Li-Chuan
Chen Li
Li Shen-Min
ACTA PHYSICO-CHIMICA SINICA, 2010, 26 (10) : 2793 - 2800
[44] Order and disorder in quaternary atomic laminates from first-principles calculations
Dahlqvist, Martin
Rosen, Johanna
PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2015, 17 (47) : 31810 - 31821
[45] Atomic-level insights into the initial oxidation mechanism of highentropy diborides by first-principles calculations
Liu, Yiwen
Yu, Hulei
Meng, Hong
Chu, Yanhui
JOURNAL OF MATERIOMICS, 2024, 10 (02) : 423 - 430
[46] Perovskite Solar Cells: From the Atomic Level to Film Quality and Device Performance
Saliba, Michael
Correa-Baena, Juan-Pablo
Gratzel, Michael
Hagfeldt, Anders
Abate, Antonio
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, 2018, 57 (10) : 2554 - 2569
[47] Modeling industrial catalytic reaction systems from first-principles.
Neurock, M
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2000, 220 : U174 - U174
[48] The modeling of a tokamak plasma discharge, from first principles to a flight simulator
Fable, E.
Janky, F.
Treutterer, W.
Englberger, M.
Schramm, R.
Muraca, M.
Angioni, C.
Kudlacek, O.
Poli, E.
Reich, M.
Siccinio, M.
Tardini, G.
Weiland, M.
Wu, C.
Zohm, H.
PLASMA PHYSICS AND CONTROLLED FUSION, 2022, 64 (04)
[49] Modeling glasses from first principles using random structure sampling
Wolf, Laszlo
Novick, Andrew
Stevanovic, Vladan
JOURNAL OF APPLIED PHYSICS, 2025, 137 (09)
[50] Modeling elementary reactions in coke formation from first principles.
Van Speybroeck, V
Reyniers, MF
Marin, GB
Waroquier, M
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2004, 228 : U674 - U674

← 1 2 3 4 5 →