Adsorption removal of copper(II) using chitosan from simulated rinse solutions containing chelating agents

被引：111
|
作者：
Juang, RS [1 ]
Wu, FC
Tseng, RL
机构：
[1] Yuan Ze Univ, Dept Chem Engn, Chungli 320, Taiwan
[2] Lien Ho Jr Coll Technol, Dept Chem Engn, Maio Li 360, Taiwan
[3] Lien Ho Jr Coll Technol, Dept Environm Engn, Maio Li 360, Taiwan
来源：
WATER RESEARCH | 1999年 / 33卷 / 10期
关键词：
adsorption; isotherm; chitosan; copper ions; rinse solution; chelating agents;
D O I：
10.1016/S0043-1354(98)00469-2
中图分类号：
X [环境科学、安全科学];
学科分类号：
08 ; 0830 ;
摘要：
The adsorption ability of Cu(II) using chitosan from simulated rinse solutions containing chelating agents was studied. Four chelating agents including ethylenediaminetetraacetic acid (EDTA), citric acid, tartaric acid and sodium gluconate were selected. It was shown that the concentration ratio of chelating agent to Cu(II) as well as the NaOH concentration significantly affected the adsorption capacity. Competition between coordination of Cu(II) with unprotonated chitosan and electrostatic interaction of Cu(II) chelates with protonated chitosan played an important role in this adsorption system. The maximum adsorption capacity was found within each optimal pH range. This work provided a simple criteria for adsorption removal of Cu(II) from such industrial rinse solutions (0.3-5.0 mol/m(3)) using chitosan. (C) 1999 Elsevier Science Ltd. Aii rights reserved.
引用
收藏
页码：2403 / 2409
页数：7
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