A finite-element analysis of surface wave plasmas

被引：1
|
作者：
Igarashi, H [1 ]
Watanabe, K [1 ]
Ito, T [1 ]
Fukuda, T [1 ]
Honma, T [1 ]
机构：
[1] Hokkaido Univ, Grad Sch Engn, Sapporo, Hokkaido 0608628, Japan
来源：
IEEE TRANSACTIONS ON MAGNETICS | 2004年 / 40卷 / 02期
关键词：
chemical vapor deposition (CVD); finite-difference time-domain (FDTD); finite-element method (FEM); plasma; surface wave;
D O I：
10.1109/TMAG.2004.825450
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
This paper describes a finite-element analysis of surface microwaves coupled to a cold nonmagnetized plasma for chemical vapor deposition (CVD). The microwave-plasma coupling is taken into account by introducing the frequency-dependent permittivity. The computed resonant modes of the surface wave on the interface between the dielectric and plasma in a cylindrical vessel are shown to be in good agreement with the theoretical ones. Moreover, the computed field distribution for a waveguide loaded cylindrical vessel agrees well with that computed by the finite-difference time-domain (FDTD) method.
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页码：605 / 608
页数：4
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