Reflection absorption infrared spectroscopy analysis of the evolution of ErSb on InSb

被引:1
|
作者
Norris, Kate J. [1 ,2 ,3 ]
Wong, Vernon K. [1 ,2 ,3 ]
Onishi, Takehiro [1 ]
Lohn, Andrew J. [1 ,2 ,3 ]
Coleman, Elane [4 ]
Tompa, Gary S. [4 ]
Kobayashi, Nobuhiko P. [1 ,2 ,3 ]
机构
[1] Univ Calif Santa Cruz, Baskin Sch Engn, Santa Cruz, CA 95064 USA
[2] Univ Calif Santa Cruz, Adv Studies Labs, Nanostruct Energy Convers Technol & Res NECTAR, Moffett Field, CA USA
[3] NASA, Ames Res Ctr, Moffett Field, CA 94035 USA
[4] Struct Mat Ind Inc, Piscataway, NJ USA
关键词
ErSb; InSb; Infrared absorption; MOCVD; AFM; Evolution; Island; Surface coverage;
D O I
10.1016/j.susc.2012.06.004
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We discuss an ex-situ monitoring technique based on glancing-angle infrared-absorption used to determine small amounts of erbium antimonide (ErSb) deposited on an indium antimonide (InSb) layer epitaxially grown on an InSb (100) substrate by low pressure metal organic chemical vapor deposition (MOCVD). Infrared absorption from the indium-hydrogen (In - H) stretching mode at 1754.5 cm(-1) associated with a top most surface of an epitaxial InSb layer was used to compare varying levels of surface coverage with ErSb. Among four samples of varying coverage of ErSb deposition (7.2 to 21.5 monolayers), detected infrared absorption peaks distinct to In - H weakened as ErSb surface coverage increased. In the early stage of ErSb deposition, our study suggests that outermost indium atoms in the InSb buffer layer are replaced by Er resulting in increase in absorption associated with the In - H mode. Using this simple ex-situ technique, we show that it is possible to calibrate the amount of ErSb deposited atop each individual InSb substrate for depositions of few to tens of monolayers. (C) 2012 Elsevier B.V. All rights reserved.
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页码:1556 / 1559
页数:4
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