The effect of kink and vertical leakage mechanisms in GaN-on-Si epitaxial layers

被引:1
|
作者
Song, Chunyan [1 ,2 ]
Yang, Xuelin [2 ]
Wang, Ding [2 ]
Ji, Panfeng [2 ]
Wu, Shan [2 ]
Xu, Yue [2 ]
Wang, Maojun [3 ]
Shen, Bo [2 ]
机构
[1] Shihezi Univ, Sch Sci, Dept Phys, Shihezi 832003, Peoples R China
[2] Peking Univ, Sch Phys, State Key Lab Artificial Microstruct & Mesoscop P, Beijing 100871, Peoples R China
[3] Peking Univ, Inst Microelect, Beijing 100871, Peoples R China
基金
中国国家自然科学基金;
关键词
GaN-on-Si epitaxial layers; vertical leakage mechanisms; the kink; BREAKDOWN;
D O I
10.1088/1361-6641/ab9068
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The connection between the kink position and vertical leakage mechanisms in GaN-on-Si epitaxial layers has been investigated. Based on combined experimental data and TCAD simulation results, we demonstrate that band-to-band tunneling and Poole-Frenkel effect greatly affect the current-voltage behaviors of GaN-on-Si epitaxial layers. Band-to-band tunneling occurring in both GaN and AlGaN layers could change a kink position, and Poole-Frenkel effect happening at high biases increases the slope of J-V at the voltage region after the kink. On the other hand, we found that the kink position is related to the depletion region width at the AlN/Si interface by numerical simulation. When the connection between the kink and leakage mechanisms was considered, numerical simulation results are consistent well with the current-voltage-temperature experimental results in GaN-on-Si epitaxial layers.
引用
收藏
页数:6
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