Proposal of new interconnection technique for very high-voltage IC's

被引:20
|
作者
Fujihira, T
Yano, Y
Obinata, S
Kumagai, N
Sakurai, K
机构
[1] FUJI ELECT CORP RES & DEV LTD, MATSUMOTO, NAGANO 390, JAPAN
[2] YAMANASHI UNIV, GRAD SCH ENGN, KOUFU 400, JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1996年 / 35卷 / 11期
关键词
high voltage; HVIC; interconnection; electric shielding; self-shielding; level shifter; self-isolation;
D O I
10.1143/JJAP.35.5655
中图分类号
O59 [应用物理学];
学科分类号
摘要
A new, cost-effective, high-voltage interconnection technique for very high-voltage IC's, called the ''self-shielding technique''; is proposed. To avoid reduction of the breakdown voltage of high-voltage devices due to the electric potential of overlying interconnections, only the self-PN-junction structures of the high-voltage devices themselves are utilized in the self-shielding technique. No additional shielding structure is required, even to realize a very high-voltage IC above 1000V. The design concept and device structures are presented with the experimental results on the electrical characterictics of self-shielded interconnections and on the operations of self-shielded 1200-V level shifters. Comparison between sell-shielded and conventional high-voltage IC's (HVIC's) and the process and the devices of self-shielded HVIC technology are also described.
引用
收藏
页码:5655 / 5663
页数:9
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