XAFS study on the microstructure of Mo/Si multilayers

X-ray absorption fine structure(XAFS) was used to investigate the structure of Mo/Si multilayers from 20 Angstrom to 3000 Angstrom period value. The XAFS results show the structural disorder of Mo atom neighbor environment is significantly increased as the thickness of Mo layer is thinner. For 20 Angstrom and 50 Angstrom period Mo/Si multilayers, the polycrystalline Mo layer vanish, the first neighbor coordination of Mo atom is mainly surrounded by Si atoms, the intended small period structure were drastically destroyed by interdiffusion. The mixed layer is amorphous MoSi2. XAFS results confirm that there is no clear period structure in very small period Mo/Si multilayer.