The effect of compound composition and strain on vacancies in Si/SiGe heterostructures

被引:3
|
作者
Ganchenkova, MG
Borodin, VA
Nicolaysen, S
Nieminen, RM
机构
[1] Helsinki Univ Technol, Espoo 02015, Finland
[2] RRC Kurchatov Inst, Moscow 123182, Russia
[3] Univ Oslo, Dept Phys, N-0316 Oslo, Norway
[4] Inst Microsyst Technol, N-3103 Tonsberg, Norway
来源
GETTERING AND DEFECT ENGINEERING IN SEMICONDUCTOR TECHNOLOGY XI | 2005年 / 108-109卷
关键词
silicon; germanium; heterostructure; vacancy; strain; ab initio; kinetic Monte-Carlo;
D O I
10.4028/www.scientific.net/SSP.108-109.457
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this paper we study the effect of chemical environment and elastic strains, which can arise in layered heterostructures due to the lattice parameter mismatch, on the vacancy formation energy in random Si-Ge compounds. Ab initio calculations demonstrate a number of simple trends characterizing the vacancy formation energy dependence on vacancy charge, the number of Ge atoms in its neighbourhood and on the magnitude of elastic strains. The obtained parameters of vacancy- germanium interaction indicate, in particular, a tendency for preferential vacancy accumulation in SiGe region of Si/SiGe/Si layered structures, which is confirmed here by MonteCarlo simulation of high-temperature vacancy annealing and agrees well with recent experimental observations.
引用
收藏
页码:457 / 462
页数:6
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