Surface-induced resistivity of thin metallic films bounded by a rough fractal surface

被引:23
|
作者
Munoz, RC
Finger, R
Arenas, C
Kremer, G
Moraga, L
机构
[1] Univ Chile, Dept Fis, Santiago 6511226, Chile
[2] Univ Chile, Dept Ingn Elect, Fac Ciencias Fis & Matemat, Santiago 6511226, Chile
[3] Univ Chile, Fac Ciencias, Dept Fis, Santiago, Chile
来源
PHYSICAL REVIEW B | 2002年 / 66卷 / 20期
关键词
D O I
10.1103/PhysRevB.66.205401
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have extended the modified formalism of Sheng, Xing, and Wang [J. Phys.: Condens. Matter 11 L299 (1999)] to allow the calculation of the conductivity of a thin metallic film bounded by a rough fractal surface. We utilized the so-called k-correlation model proposed by Palasantzas and Barnas [Phys. Rev. B 48, 14 472 (1993); 56, 7726 (1997)], to describe the height-height autocorrelation function corresponding to a self-affine roughness. This extension permits the calculation of the conductivity of the film as a function of the r.m.s. roughness amplitude delta, of the lateral correlation length xi, of the mean free path in the bulk l, and of the roughness exponent H. We found that the degree of surface irregularity, represented by the roughness exponent H characterizing the surface, does influence the conductivity of the film, as first discovered by Palasantzas and Barnas. However, this influence manifests itself for large bulk mean free paths lapproximate to1000 nm and for large correlation lengths xiapproximate to5 nm, in which case the conductivity of the film for H = 1 exceeds by about 30% the conductivity for H = 0.2, an effect which is smaller than that reported by Palasantzas and Barnas. For correlation lengths xi below 1 nm and mean free paths lapproximate to100 nm, the influence of the roughness exponent H on the conductivity is reduced to below 10%, and for smaller mean free paths and correlation lengths the conductivity becomes insensitive to H. We also found that Mathiessen's rule is severily violated in the case of thin metallic films. The resistivity of the film coincides roughly with the surface-limited resistivity only in the case of ultrathin films t<5 nm. For thicker films 100 nm>t>5 nm, the resistivity of the film exceeds by some 20 to 30 % the value dictated by Mathiessen's rule. And conversely, the apparent surface-induced resistivity estimated assuming the validity of Mathiessen's rule, exceeds by nearly one order of magnitude the true surface-induced resistivity, except in the case of ultrathin films t<5 nm.
引用
收藏
页码:1 / 9
页数:9
相关论文
共 50 条
  • [41] Resistivity scaling in metallic thin films and nanowires due to grain boundary and surface roughness scattering
    Moors, Kristof
    Soree, Bart
    Magnus, Wim
    MICROELECTRONIC ENGINEERING, 2017, 167 : 37 - 41
  • [42] Calculations of the surface shape anisotropy induced at rough surfaces of ferromagnetic thin films
    Choe, SB
    Shin, SC
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2001, 38 (04) : 392 - 395
  • [43] Surface-induced hydrogelation
    Bieser, AM
    Tiller, JC
    CHEMICAL COMMUNICATIONS, 2005, (31) : 3942 - 3944
  • [44] On the fractal model of a rough surface
    Yermolenko, S. B.
    Burkovets, D. N.
    Prydiy, A. G.
    SEVENTH INTERNATIONAL CONFERENCE ON CORRELATION OPTICS, 2006, 6254
  • [45] Reconstruction of a fractal rough surface
    Cai, ZJ
    Chen, DQ
    Lu, S
    PHYSICA D-NONLINEAR PHENOMENA, 2006, 213 (01) : 25 - 30
  • [46] SURFACE-INDUCED NUCLEATION
    BROWN, G
    CHAKRABARTI, A
    MARKO, JF
    PHYSICAL REVIEW E, 1994, 50 (02): : 1674 - 1677
  • [47] Surface roughness of metallic films determined by resistivity measurements.
    Cabrera, AL
    Garrido, W
    Colino, J
    Schuller, LK
    Lederman, D
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1997, 213 : 293 - COLL
  • [48] Theoretical model for fast calculations of the electrical resistivity of thin metallic films with rough surfaces
    Pribylov, Alexander. A.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2021, 39 (02):
  • [49] Surface roughness modulated resistivity in copper thin films
    HongKang Song
    Ke Xia
    Jiang Xiao
    Science China(Physics,Mechanics & Astronomy), 2018, (10) : 74 - 81
  • [50] Surface roughness modulated resistivity in copper thin films
    Song, HongKang
    Xia, Ke
    Xiao, Jiang
    SCIENCE CHINA-PHYSICS MECHANICS & ASTRONOMY, 2018, 61 (10)