The effect of tungsten coating on the properties of diamond thick films

被引：0
|
作者：
Sun, Xin-yuan [1 ]
Zhou, Ling-ping [2 ]
Wang, Wen-feng [1 ]
Chen, Ben-jing [2 ]
机构：
[1] Jinggangshan Univ, Dept Phys, Jian 343009, Jiangxi, Peoples R China
[2] Hunan Univ, Coll Mat Sci & Engn, Changsha 410082, Hunan, Peoples R China
来源：
RUSSIAN JOURNAL OF PHYSICAL CHEMISTRY A | 2008年 / 82卷 / 09期
关键词：
D O I：
10.1134/S0036024408090343
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
According to the physical properties of pure tungsten and tantalum and their carbides, a layer of tungsten thin films coating three tantalum filaments at a current of 750 A was prepared by us for the first time and called tungsten coating. Diamond thick films were deposited in a hot filament chemical vapor deposition (HFCVD) reactor using tantalum filaments before and after tungsten coating, respectively. The success of tungsten coating is verified by scanning electron microscopy examination of these filaments. The remarkable discrepancies in thermal conductivity, colors of diamond thick films, and electron dispersion spectroscopy of the films substantiate the success of tungsten coating, too. The effects of tungsten coating on the quality of diamond films were finally evaluated by Raman spectra.
引用
收藏
页码：1596 / 1600
页数：5
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