Optical and Morphological Characteristics of Nanostructured Titanium Dioxide Thin Films Prepared by DC Reactive Magnetron Sputtering Technique

In this work, the optical characteristics of nanostructured titanium dioxide thin films prepared by DC reactive magnetron sputtering technique. These characteristics were controlled by controlling the spatial distribution of plasma column generated between discharge electrodes throughout varying the inter-electrode distance from 2 to 5cm, discharge current from 10 to 50 mA and working pressure from 0.04 to 0.1 mbar. The absorption spectra, x-ray diffraction patterns and atomic force microscopy of the prepared films were recorded at different inter-electrode distances and compared to the published results. This is good attempt to optimize the optical characteristics of nanostructured titanium dioxide thin films for optical and spectral applications.