Structural, electrical and magnetic investigations of conductive ZnO:Co thin films deposited by DC reactive magnetron co-sputtering

被引:2
|
作者
Lardjane, S. [1 ,2 ]
Yazdi, M. Arab Pour [1 ]
Fenineche, N. [1 ]
Merad, G. [2 ]
Feraoun, H. I. [2 ]
Billard, A. [1 ]
机构
[1] UTBM, IRTES LERMPS, Site Montbeliard, F-90010 Belfort, France
[2] Univ Abou Bekr Belkaid Tlemcen, Lab LEPM, Tilimsen, Algeria
关键词
Spintronics; Thin films; Diluted magnetic semiconductors; Magnetron sputtering; Magnetic properties; CO; FERROMAGNETISM;
D O I
10.4028/www.scientific.net/KEM.543.251
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Zn1-xCoxO (O < x < 14.6) diluted magnetic semiconductor coatings have been obtained by reactive DC magnetron sputtering of metallic Zn and Co targets at high pressure and high temperature. The coatings structural properties have been investigated by X-ray diffraction. All as-deposited coatings are crystalized in ZnO structure and neither traces of metallic nor oxide Co-rich clusters were detected in the films The temperature dependence of the magnetization shows a paramagnetic Curie-Weiss behavior with antiferromagnetic interaction due to the associated spins and simple paramagnetic curie behavior of isolated free spins.
引用
收藏
页码:251 / +
页数:2
相关论文
共 50 条
  • [41] MgyNi1-y(Hx) thin films deposited by magnetron co-sputtering
    Mongstad, T.
    You, C. C.
    Thogersen, A.
    Maehlen, J. P.
    Platzer-Bjorkman, Ch
    Hauback, B. C.
    Karazhanov, S. Zh
    JOURNAL OF ALLOYS AND COMPOUNDS, 2012, 527 : 76 - 83
  • [42] Silver-enriched ZnO:Ag thin films deposited by magnetron co-sputtering: Post annealing effects on structural and physical properties
    Ramadan, Rehab
    Dadgostar, S.
    Manso-Silvan, M.
    Perez-Casero, R.
    Hernandez-Velez, M.
    Jimenez, J.
    Sanchez, O.
    MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, 2022, 276
  • [43] AlTiCrN coatings deposited by hybrid HIPIMS/DC magnetron co-sputtering
    Zhou, Hui
    Zheng, Jun
    Gui, Binhua
    Geng, Dongsen
    Wang, Qimin
    VACUUM, 2017, 136 : 129 - 136
  • [44] Microstructural characterisation of TiAl thin films grown by DC magnetron co-sputtering technique
    Padmaprabu, C
    Kuppusami, P
    Terrance, ALE
    Mohandas, E
    Raghunathan, VS
    Banerjee, S
    Sanyal, MK
    MATERIALS LETTERS, 2000, 43 (03) : 106 - 113
  • [45] Electrical and magnetic properties of (In, Co) co-doped ZnO films deposited using radio frequency magnetron sputtering
    Liu F.
    Dai M.-J.
    Lin S.-S.
    Shi Q.
    Sun H.
    Sun, Hui (huisun@sdu.edu.cn), 1600, Science Press (43): : 385 - 391
  • [46] Structural and Optical Characterization of ZnO Thin Films Deposited by Reactive rf Magnetron Sputtering
    Youssef, S.
    Combette, P.
    Podlecki, J.
    Al Asmar, R.
    Foucaran, A.
    CRYSTAL GROWTH & DESIGN, 2009, 9 (02) : 1088 - 1094
  • [47] Structural and optical properties of ZnO thin films with heavy Cu-doping prepared by magnetron co-sputtering
    Liu, Yong
    Liu, Haonan
    Yu, Yang
    Wang, Qing
    Li, Yinglan
    Wang, Zhi
    MATERIALS LETTERS, 2015, 143 : 319 - 321
  • [48] Comprehensive characterization of Al-doped ZnO thin films deposited in confocal radio frequency magnetron co-sputtering
    Challali, Fatiha
    Touam, Tahar
    Bockelee, Valerie
    Chauveau, Thierry
    Chelouche, Azeddine
    Stephant, Nicolas
    Hamon, Jonathan
    Besland, Marie -Paule
    THIN SOLID FILMS, 2023, 780
  • [49] Structural, electrical, and optical properties of transparent conductive oxide ZnO:Al films prepared by dc magnetron reactive sputtering
    Chen, M
    Pei, ZL
    Wang, X
    Sung, C
    Wen, LS
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2001, 19 (03): : 963 - 970
  • [50] Preparation and properties of ZnO:Al (ZAO) thin films deposited by DC reactive magnetron sputtering
    Pei, ZL
    Zhang, XB
    Wang, TG
    Gong, J
    Sun, C
    Wen, LS
    ACTA METALLURGICA SINICA, 2005, 41 (01) : 84 - 88