Structural and optical properties of crystalline silicon thin films deposited on porous alumina

被引：0
|
作者：
Ktifa, S. [1 ]
Ghrib, M.
Saadallah, F. [1 ]
Yacoubi, N. [1 ]
机构：
[1] Photothermal Lab, Nabeul, Tunisia
来源：
PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 9, NO 10-11 | 2012年 / 9卷 / 10-11期
关键词：
porous alumina; nanocrystalline silicon; photothermal deflection spectroscopy; BAND-GAP SHRINKAGE;
D O I：
10.1002/pssc.201200044
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The goal of this work is to investigate the influence of the anodization current on the optical properties of porous alumina layer, on which crystalline silicon films are deposited by a PECVD technique. Porous alumina layers were grown by a simple electrochemical anodization method, varying the anodizing voltage between 200 to 400 mV. The structural properties of the Si/Al2O3 films were studied by using Raman spectroscopy and XRD. Photothermal deflection spectroscopy (PDS) is used to determine the gap energy and the optical absorption spectrum by comparing the experimental amplitude of the photothermal signal to the corresponding theoretical one. (C) 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码：2177 / 2179
页数：3
相关论文
共 50 条
  • [1] Structural, optical and mechanical properties of amorphous and crystalline alumina thin films
    Nayar, Priyanka
    Khanna, Atul
    Kabiraj, D.
    Abhilash, S. R.
    Beake, Ben D.
    Losset, Yannick
    Chen, Banghao
    THIN SOLID FILMS, 2014, 568 : 19 - 24
  • [2] Structural and physical properties of thin copper films deposited on porous silicon
    Ghosh, S
    Hong, K
    Lee, C
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2002, 96 (01): : 53 - 59
  • [3] Structural and optical properties of polycrystalline silicon thin films deposited by PECVD method
    Zhu, FR
    Kohara, H
    Fuyuki, T
    Matsunami, H
    CONFERENCE RECORD OF THE TWENTY FIFTH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE - 1996, 1996, : 709 - 712
  • [4] Optical properties of porous silicon thin films
    Rotaru, C
    Tomazeiu, N
    Craciun, G
    JOURNAL OF MOLECULAR STRUCTURE, 1999, 481 : 293 - 296
  • [5] Optical properties of ultra-thin silicon films deposited on nanostructured anodic alumina surfaces
    Wang, Shu-Yi
    Borca-Tasciuc, Diana-Andra
    Kaminski, Deborah A.
    APPLIED PHYSICS LETTERS, 2014, 104 (08)
  • [6] The effects of porous silicon on the crystalline properties of ZnO thin films
    Cai, Hong
    Shen, Honglie
    Yin, Yugang
    Lu, Linfeng
    Shen, Jiancang
    Tang, Zhengxia
    JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 2009, 70 (06) : 967 - 971
  • [7] Structural and optical properties of pulsed-laser deposited crystalline β-Ga2O3 thin films on silicon
    Berencen, Y.
    Xie, Y.
    Wang, M.
    Prucnal, S.
    Rebohle, L.
    Zhou, Shengqiang
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2019, 34 (03)
  • [8] Preparation and optical properties of colorized porous alumina thin films
    Yang, Shu-Min
    Li, Hai-Tao
    Gu, Jian-Jun
    Han, Wei
    Yang, Wei
    Qi, Yun-Kai
    Cailiao Gongcheng/Journal of Materials Engineering, 2015, 43 (04): : 30 - 36
  • [9] Superconducting properties of Nb thin films deposited on porous silicon templates
    Trezza, M.
    Prischepa, S. L.
    Cirillo, C.
    Fittipaldi, R.
    Sarno, M.
    Sannino, D.
    Ciambelli, P.
    Hesselberth, M. B. S.
    Lazarouk, S. K.
    Dolbik, A. V.
    Borisenko, V. E.
    Attanasio, C.
    JOURNAL OF APPLIED PHYSICS, 2008, 104 (08)
  • [10] Superconducting properties of Nb thin films deposited on porous silicon templates
    Trezza, M.
    Prischepa, S.L.
    Cirillo, C.
    Fittipaldi, R.
    Sarno, M.
    Sannino, D.
    Ciambelli, P.
    Hesselberth, M.B.S.
    Lazarouk, S.K.
    Dolbik, A.V.
    Borisenko, V.E.
    Attanasio, C.
    Journal of Applied Physics, 2008, 104 (08):
12345