Photoelectron Emission from Yttrium Thin Films Prepared by Pulsed Laser Deposition

被引：18
|
作者：
Cultrera, L. [2 ]
Grigorescu, S. [3 ]
Gatti, G. [2 ]
Miglietta, P. [1 ,4 ]
Tazzioli, F. [2 ]
Perrone, A. [1 ,4 ]
机构：
[1] Univ Salento, Dept Phys, I-73100 Lecce, Italy
[2] Natl Labs Frascati, Natl Inst Nucl Phys, I-00046 Frascati, Italy
[3] Natl Inst Laser Plasma & Radiat Phys, Laser Dept, Bucharest 77125, Romania
[4] Univ Salento, Natl Inst Nucl Phys, I-73100 Lecce, Italy
来源：
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY | 2009年 / 9卷 / 02期
关键词：
Electron Beams; Thin Films; Metallic Photocathodes; RF PHOTOINJECTORS; MG FILMS; PHOTOCATHODES; PHOTOEMISSION; EFFICIENCY; MAGNESIUM; ULTRAVIOLET; ADSORPTION; MG(0001); METALS;
D O I：
10.1166/jnn.2009.C208
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
We present the results of our investigation of metallic films as suitable materials for the production of intense electron beams. Thin films of Y prepared for the first time by pulsed laser deposition on Si substrates have been tested as photocathodes in an ultra high vacuum photodiode chamber at 10(-6) Pa. High quantum efficiencies have been obtained for the deposited films, comparable to those of corresponding bulks. The role of the adsorbed gases on the emission performance has been studied. Systematic laser cleaning treatments improved the quantum efficiency (QE) from 10(-6) to 4.5 10(-4). The samples could stay for several months in open air before being tested in a photodiode cell. The deposition process and testing results are presented.
引用
收藏
页码：1585 / 1588
页数：4
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