DOPED ZINC OXIDE THIN FILMS AS TRANSPARENT CONDUCTIVE ELECTRODES

被引:0
|
作者
Nistor, M. [1 ]
机构
[1] Natl Inst Lasers Plasma & Radiat Phys, Plasma Phys & Nucl Fus Lab, Bucharest 77125, Romania
关键词
doped zinc oxide; thin films; pulsed electron beam deposition; channel-spark; ZNO FILMS; GROWTH;
D O I
暂无
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Sn doped ZnO thin films have been deposited on c-cut sapphire single crystal substrates at 200 degrees C by pulsed electron beam deposition. The kinetic energies of the ions in the plasma plume determined from ion probe measurements, present a relatively broad distribution of the energies from a few eV to one hundred eV. Sn doped ZnO films have a graded composition, with a slightly in-depth variation of Sn. The transmittance of the films was about 87% in the visible wavelength range. The resistivity was 0.4 Omega cm at room temperature and showed a classical semiconductor behavior with the temperature.
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页码:1313 / 1322
页数:10
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