Recent progress in quantum and nonlinear optical lithography (vol 53, pg 713, pg 2006)

被引：1

|

作者：

Boyd, RW

Bentley, SJ

机构：

来源：

JOURNAL OF MODERN OPTICS | 2006年 / 53卷 / 10期

关键词：

D O I：

10.1080/09500340600793463

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

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页码：1529 / 1529

页数：1

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