Recent progress in quantum and nonlinear optical lithography (vol 53, pg 713, pg 2006)

被引：1
|
作者：
Boyd, RW
Bentley, SJ
机构：
来源：
JOURNAL OF MODERN OPTICS | 2006年 / 53卷 / 10期
关键词：
D O I：
10.1080/09500340600793463
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
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页码：1529 / 1529
页数：1
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