Microstructure, oxidation resistance, mechanical and tribological properties of Mo-Al-N films by reactive magnetron sputtering

被引：69
|
作者：
Xu, Junhua [1 ]
Ju, Hongbo [1 ]
Yu, Lihua [1 ]
机构：
[1] Jiangsu Univ Sci & Technol, Sch Mat Sci & Engn, Key Lab Adv Welding Technol, Zhenjiang 212003, Jiangsu, Peoples R China
来源：
VACUUM | 2014年 / 103卷
基金：
中国国家自然科学基金;
关键词：
Reactive magnetron sputtering; Mo-Al-N films; Oxidation resistance; Tribological properties; COATINGS; BEHAVIOR; WEAR; CRN; FRICTION;
D O I：
10.1016/j.vacuum.2013.11.013
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Mo-Al-N films with various Al content (3.7 at.%-18.3 at.%) were deposited by reactive magnetron sputtering and the effects of Al content on the microstructure, mechanical, oxidation resistance and tribological properties of Mo-Al-N films were investigated. The results showed that the synthesized Mo-Al-N films exhibited the face-centered cubic (fcc) structure with (111)-preferred orientation. The oxidation resistance of Mo-Al-N films increased with increasing Al content. The hardness and elastic modulus of Mo-Al-N films first increased and then decreased with increasing Al content in the films and the highest values were 32.6 GPa and 494 GPa, respectively, at 3.7 at.% Al. The films with an Al content in the range between 4.1 at.% and 9.5 at.% were found to be optimized for wear resistance applications, which showed low average friction coefficient values of 0.31-0.35 and wear rate of 3.6 x 10(-9) -8.1 x 10(-9) mm(3)/Nmm. (C) 2013 Published by Elsevier Ltd.
引用
收藏
页码：21 / 27
页数：7
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