Syntheses and mechanical properties of Ti-B-C coatings by a plasma-enhanced chemical vapor deposition

被引:26
|
作者
Ok, JT
Park, IW
Moore, JJ
Kang, MC
Kim, KH [1 ]
机构
[1] Pusan Natl Univ, Sch Mat Sci & Engn, Pusan 609735, South Korea
[2] Colorado Sch Mines, ACSEL, Golden, CO 80401 USA
[3] Pusan Natl Univ, Sch Mech Engn, ERC, NSDM, Pusan 609735, South Korea
来源
SURFACE & COATINGS TECHNOLOGY | 2005年 / 200卷 / 5-6期
关键词
PECVD; Ti-B-C coatings; microhardness; friction coefficient;
D O I
10.1016/j.surfcoat.2005.08.078
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Ti-B-C coatings were synthesized on WC-Co and Si wafer substrates by PECVD technique using a gaseous mixture of TiCl4, BCl3, CH4, Ar, and H-2. In this work, the boron content was varied in a wide range from TiC to TiB2, and microstructure and mechanical properties of synthesized Ti-B-C coatings were systematically investigated. From our instrumental analyses, the synthesized Ti-B-C coatings was concluded to be composites consisting of nanocrystallites TiC, quasi-amorphous TiB2, and amorphous carbon at low boron content, on the contrary, nanocrystallites TiB2, quasi-amorphous TiC, and amorphous carbon at relatively high boron content. The microhardness of the Ti-B-C coatings increased from similar to 23 GPa of TiC to similar to 38 GPa of Ti0.33B0.55C0.11 coatings with increasing the boron content. The Ti0.33B0.55C0.11 coatings showed lower average friction coefficient of 0.45, in addition, it showed relatively better wear behavior compared to other binary coatings of TiB2 and TiC. (c) 2005 Elsevier B.V All rights reserved.
引用
收藏
页码:1418 / 1423
页数:6
相关论文
共 50 条
  • [11] Metal coatings on SiC nanowires by plasma-enhanced chemical vapor deposition
    Aaron D. LaLonde
    M. Grant Norton
    David N. McIlroy
    Daqing Zhang
    Radhakrishnan Padmanabhan
    Abdullah Alkhateeb
    Hongmei Han
    Nicholas Lane
    Zachery Holman
    Journal of Materials Research, 2005, 20 : 549 - 553
  • [12] Mechanical properties of boron nitride films prepared by plasma-enhanced chemical vapor deposition
    Yang, HS
    Yoshida, T
    SURFACE & COATINGS TECHNOLOGY, 2005, 200 (1-4): : 984 - 987
  • [13] Plasma-enhanced chemical vapor deposition of copper
    Awaya, Nobuyoshi
    Arita, Yoshinobu
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1991, 30 (08): : 1813 - 1817
  • [14] PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION
    MOLLER, W
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1993, 56 (06): : 469 - 469
  • [15] PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF AIN COATINGS ON GRAPHITE SUBSTRATES
    ITOH, H
    KATO, M
    SUGIYAMA, K
    THIN SOLID FILMS, 1987, 146 (03) : 255 - 264
  • [16] The effect of deposition temperature and boron addition in Ti-B-C-N films deposited by plasma-enhanced chemical vapor deposition
    Abraham, Sudeep
    Ok, Jung Tae
    Kim, Kwang Ho
    JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, 2007, 187 : 571 - 574
  • [17] Microstructure and properties of Ti-Si-N films prepared by plasma-enhanced chemical vapor deposition
    Feng Chia Univ, Taichung, Taiwan
    Mater Chem Phys, 1 (9-16):
  • [18] Microstructure and properties of Ti-Si-N films prepared by plasma-enhanced chemical vapor deposition
    He, JL
    Chen, CK
    Hon, MH
    MATERIALS CHEMISTRY AND PHYSICS, 1996, 44 (01) : 9 - 16
  • [19] Deposition mechanisms in plasma-enhanced chemical vapor deposition of titanium
    Itoh, T
    Chang, M
    Ellwanger, R
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 1999, 2 (10) : 531 - 533
  • [20] PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF COPPER
    AWAYA, N
    ARITA, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1991, 30 (08): : 1813 - 1817