Chemical vapor deposition of vanadium (V) oxide using two different precursors: Effects of precursor chemistry on film morphology

被引：0
|
作者：
Leonard, Heidi [1 ]
Moersch, Tyler [1 ]
Taylor, Charles [1 ]
机构：
[1] Pomona Coll, Dept Chem, Claremont, CA 91711 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2010年 / 240卷
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D O I：
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
756-INOR
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页数：1
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