Development of the spin-valve transistor

被引:0
|
作者
Monsma, DJ [1 ]
Vlutters, R [1 ]
Shimatsu, T [1 ]
Keim, EG [1 ]
Mollema, RH [1 ]
Lodder, JC [1 ]
机构
[1] UNIV TWENTE,MAT RES CTR,NL-7500 AE ENSCHEDE,NETHERLANDS
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暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
As the easiest experimental approach, GMR (Giant Magnetoresistance) is usually measured using the Current in Plane (CIP)-GMR. The spin-valve transistor has previously been presented as a spectroscopic tool to measure Current Perpendicular to the Planes (CPP)-GMR. Hot electrons cross the magnetic multilayer base quasi-ballistically and the number reaching the collector depends exponentially on the perpendicular hot electron mean free path. Collector current changes of 390% at 77K have already been measured. Apart from the substantial fundamental value, such properties may be useful for sensor applications. The electron energy range fills the gap between the Fermi surface transport in resistance measurements and other hot electron techniques such as spin polarised electron energy loss spectroscopy (SPEELS). The preparation problem of the spin-valve transistor and metal base transistor structures in general, the deposition of a device quality semiconductor on top of a metal, has now been tackled by bonding of two semiconductor substrates during vacuum deposition of a metal: an excellent bond is achieved at room temperature. TEM photos show a continuous buried metal film. Apart from preparation of various metal base transistor like structures, many other fields may benefit from this new technique.
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页码:3495 / 3499
页数:5
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