InGaN/AlGaInN-based ultraviolet light-emitting diodes with indium gallium tin oxide electrodes

被引:4
|
作者
Kim, Sukwon [1 ]
Kim, Tae Geun [1 ]
机构
[1] Korea Univ, Sch Elect Engn, Seoul 136713, South Korea
基金
新加坡国家研究基金会;
关键词
Hydrogen annealing; Indium gallium tin oxide; Transparent conductive electrode; Ultraviolet light-emitting diode; OHMIC CONTACTS; GAN; PERFORMANCE;
D O I
10.1016/j.tsf.2015.08.023
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this study, In-and Sn-doped GaO (IGTO) is proposed as an alternative transparent conductive electrode for indiwum tin oxide (ITO) to improve the performance of InGaN/AlGaInN-based near ultraviolet light-emitting diodes (NUV LEDs). IGTO films were prepared by co-sputtering the ITO and Ga2O3 targets under various target power ratios. Among those, IGTO films post-annealed at 700 degrees C under a hydrogen environment gave rise to a transmittance of 94% at 385 nm and a contact resistance of 9.4 x 10-3 Omega-cm2 with a sheet resistance of 124 Omega/Upsilon. Compared to ITO-based NUV LEDs, the IGTO-based NUV LED showed a 9% improvement in the light output power, probably due to IGTO's higher transmittance, although the forward voltage was still higher by 0.23 V. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:39 / 42
页数:4
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